The Research Lab Microeletronics Bochum is located in the cleanroom of the chair of microsystems technology at Ruhr University Bochum (RUB), Faculty of electrical engineering and information technology. It offers basic technologies for Si-based microsytems and for 2D electronics on 100 mm and 200 wafers. In a 600 m2 clean room facility, two core lines are available: A MEMS line based on state-of-the-art thin film processing for SOI processes for surface MEMS. It includes PVD, PECVD and RIE processes. The 2D electronics line makes use of a 5-chamber cluster tool including two ALD chambers, PECVD and two etching chambers (Cl-based ALE, F-based RID). For both lines, all relevant characterization technologies are available. All facilities are offered to internal and external users upon availability.